Niigata, Japan

Kumiko Murayama


Average Co-Inventor Count = 9.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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4 patents (USPTO):Explore Patents

Title: Kumiko Murayama: Innovator in Silicon Wafer Technology

Introduction

Kumiko Murayama, hailing from Niigata, Japan, is a prominent inventor recognized for her contributions to silicon wafer technology. With four patents to her name, her groundbreaking work focuses on methods of manufacturing single crystal silicon wafers that enhance performance and reduce defects in semiconductor applications.

Latest Patents

Kumiko's recent innovations include two significant patents. The first patent details a method of manufacturing single crystal silicon wafer from ingot grown by Czochralski process with rapid heating/cooling process. This method involves subjecting a silicon wafer produced from a single crystal ingot to rapid thermal processes at temperatures exceeding 1300 °C in an oxidizing atmosphere. The resulting silicon wafer exhibits a high concentration of oxygen and interstitial silicon, greatly enhancing its quality.

Her second noteworthy patent is the method for heat treating a silicon wafer. This invention aims to reduce grown-in defects and minimize surface slip during rapid thermal processing while concurrently improving surface roughness. It involves a two-step heat treatment process that employs a rare gas followed by oxygen gas introduction, achieving superior results in wafer quality.

Career Highlights

Throughout her career, Kumiko has worked with leading companies in the semiconductor industry. Notably, she has contributed her expertise at Covalent Materials Corporation and GlobalWafers Japan Co., Ltd. Her work at these organizations demonstrates her commitment to advancing silicon wafer technology and its applications.

Collaborations

Kumiko has collaborated with respected professionals in the field, including Hiromichi Isogai and Takeshi Senda. These partnerships have fostered innovation and creativity, driving forward her advancements in semiconductor manufacturing techniques.

Conclusion

Kumiko Murayama's innovative spirit and dedication to improving silicon wafer technology mark her as a significant contributor to the field. Her patents not only reflect her technical acumen but also set the stage for future advancements in the semiconductor industry. As she continues her work, Kumiko remains an inspiring figure for aspiring inventors and professionals alike.

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