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For the Inventor, By the Inventor

Kyoto, Japan

Koichiro Moriyama

This inventor holds 16 USPTO granted patents, primarily in Semiconductor Processing. Top assignee: Canon Kabushiki Kaisha. Active years: 2000-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichiro Moriyama. Retrieved from https://idiyas.com/inventor/koichiro-moriyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16

% Patents Active = 50.0

Average Co-Inventor Count = 5.5

ph-index = 8

Forward Citations = 181(Granted Patents)


Location History:

  • Kyotanabe, JP (2000 - 2005)
  • Kyoto, JP (2001 - 2007)
  • Kobe, JP (2009)

Company Filing History:

goldMedal16 out of 93,258 
 
Canon Kabushiki Kaisha
 patents

Years Active: 2000-2009

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Areas of Expertise:
Semiconductor Device
Photovoltaic Element
Plasma Processing
Thin Film
Vacuum Processing
Cooling Plate
Film-Forming
Substrate Processing
Deposited Film
Temperature Gradient
16 patents (USPTO):Explore Patents
1. 7534628 - Method for forming semiconductor device and method for forming photovoltaic device (2009-05-19),
2. 7211708 - Exhaust processing method, plasma processing method and plasma processing apparatus (2007-05-01),
3. 7074641 - Method of forming silicon-based thin film, silicon-based thin film, and photovoltaic element (2006-07-11),
4. 6858087 - Vacuum-processing method using a movable cooling plate during processing (2005-02-22),
5. 6833155 - Apparatus and method for processing a substrate (2004-12-21),
6. 6794275 - Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis (2004-09-21),
7. 6667240 - Method and apparatus for forming deposited film (2003-12-23),
8. 6602347 - Apparatus and method for processing a substrate (2003-08-05),
9. 6576061 - Apparatus and method for processing a substrate (2003-06-10),
10. 6547922 - Vacuum-processing apparatus using a movable cooling plate during processing (2003-04-15),
11. 6447612 - Film-forming apparatus for forming a deposited film on a substrate, and vacuum-processing apparatus and method for vacuum-processing an object (2002-09-10),
12. 6350489 - Deposited-film forming process and deposited-film forming apparatus (2002-02-26),
13. 6338872 - Film forming method (2002-01-15),
14. 6273955 - Film forming apparatus (2001-08-14),
15. 6261862 - Process for producing photovoltaic element (2001-07-17),

Title: Innovations of Koichiro Moriyama

Introduction

Koichiro Moriyama is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of semiconductor and photovoltaic device technology. With a total of 16 patents to his name, Moriyama's work has had a substantial impact on the industry.

Latest Patents

Among his latest patents are methods for forming semiconductor devices and photovoltaic devices. One notable patent describes a method for forming a semiconductor device that includes a semiconductor layer made of a silicon-based deposited film containing crystals through plasma-enhanced chemical vapor deposition (CVD). This method involves applying a bias voltage between a high-frequency electrode and a substrate, detecting sparks, and controlling various conditions to minimize spark occurrences. Another patent focuses on an exhaust processing method that enhances the processing ability of chemical-reaction inducing means in plasma processing, improving the handling of unreacted gases or byproducts.

Career Highlights

Moriyama is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and optical products. His innovative work has contributed to advancements in semiconductor technology, which is crucial for various electronic devices.

Collaborations

He has collaborated with notable coworkers, including Masahiro Kanai and Tadashi Hori, who have also contributed to the field of semiconductor technology.

Conclusion

Koichiro Moriyama's contributions to semiconductor and photovoltaic device technology through his patents reflect his expertise and innovative spirit. His work continues to influence advancements in the industry, showcasing the importance of research and development in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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