The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Dec. 17, 2002
Tadashi Hori, Nara, JP;
Masahiro Kanai, Tokyo, JP;
Koichiro Moriyama, Kyotanabe, JP;
Hiroshi Shimoda, Nara, JP;
Hiroyuki Ozaki, Kyotanabe, JP;
Tadashi Hori, Nara, JP;
Masahiro Kanai, Tokyo, JP;
Koichiro Moriyama, Kyotanabe, JP;
Hiroshi Shimoda, Nara, JP;
Hiroyuki Ozaki, Kyotanabe, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A vacuum-processing apparatus comprising a vacuum vessel, a processing chamber arranged in the vacuum vessel and a heater for heating a circumferential wall of the processing chamber, wherein a substrate is arranged in the processing chamber and the substrate is vacuum-processed in the processing chamber, characterized in that the vacuum-processing apparatus has a cooling plate located outside the processing chamber and arranged at a position to oppose the circumferential wall of the processing chamber for cooling the circumferential wall of the processing chamber, and a mechanism for moving the cooling plate so as to change a distance between the cooling plate and the circumferential wall of the processing chamber. A vacuum-processing method for performing a surface treatment for a substrate using the vacuum-processing apparatus.