The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2007
Filed:
Apr. 02, 2001
Takeshi Shishido, Nara, JP;
Shotaro Okabe, Nara, JP;
Masahiro Kanai, Tokyo, JP;
Yuzo Koda, Kyoto, JP;
Yasuyoshi Takai, Nara, JP;
Tadashi Hori, Nara, JP;
Koichiro Moriyama, Kyoto, JP;
Hidetoshi Tsuzuki, Kanagawa, JP;
Hiroyuki Ozaki, Kyoto, JP;
Takeshi Shishido, Nara, JP;
Shotaro Okabe, Nara, JP;
Masahiro Kanai, Tokyo, JP;
Yuzo Koda, Kyoto, JP;
Yasuyoshi Takai, Nara, JP;
Tadashi Hori, Nara, JP;
Koichiro Moriyama, Kyoto, JP;
Hidetoshi Tsuzuki, Kanagawa, JP;
Hiroyuki Ozaki, Kyoto, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A chemical-reaction inducing means is provided in an exhaust line connecting a processing space for subjecting a substrate or a film to plasma processing to an exhaust means, and at least either an unreacted gas or byproduct exhausted from the processing space are caused to chemically react without allowing plasma in the processing space to reach the chemical-reaction inducing means, thereby improving the processing ability of the chemical-reaction inducing means to process the unreacted gas or byproduct.