Nara, Japan

Takeshi Shishido


Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 37(Granted Patents)


Location History:

  • Kyotanabe, JP (2002 - 2005)
  • Kyoto, JP (2005)
  • Nara, JP (2006 - 2007)

Company Filing History:


Years Active: 2002-2007

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):

Title: Innovations of Takeshi Shishido

Introduction

Takeshi Shishido is a prominent inventor based in Nara, Japan. He has made significant contributions to the field of plasma processing and thin film technology. With a total of eight patents to his name, Shishido's work has advanced the capabilities of photovoltaic elements and chemical processing methods.

Latest Patents

Among his latest patents are an exhaust processing method, a plasma processing method, and a plasma processing apparatus. The exhaust processing method involves a chemical-reaction inducing means in an exhaust line that connects a processing space to an exhaust means. This innovation allows for the chemical reaction of unreacted gases or byproducts without plasma interference, enhancing processing efficiency. Additionally, his method of forming a silicon-based thin film utilizes a source gas containing silicon fluoride and hydrogen in a vacuum vessel. This method employs a high-frequency plasma CVD technique to create a silicon-based thin film, resulting in photovoltaic elements that offer excellent performance at a lower cost compared to traditional methods.

Career Highlights

Takeshi Shishido is currently employed at Canon Kabushiki Kaisha, where he continues to develop innovative technologies. His work has been instrumental in improving the efficiency and effectiveness of various processing methods in the semiconductor industry.

Collaborations

Shishido has collaborated with notable coworkers, including Takahiro Yajima and Masahiro Kanai. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

Takeshi Shishido's contributions to plasma processing and thin film technology have made a significant impact on the industry. His innovative patents and collaborative efforts continue to push the boundaries of what is possible in semiconductor processing.

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