The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2005

Filed:

Sep. 08, 2003
Applicants:

Takahiro Yajima, Kyoto, JP;

Masahiro Kanai, Tokyo, JP;

Takeshi Shishido, Kyotanabe, JP;

Inventors:

Takahiro Yajima, Kyoto, JP;

Masahiro Kanai, Tokyo, JP;

Takeshi Shishido, Kyotanabe, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H001/02 ; H05H001/00 ; C23C016/00 ;
U.S. Cl.
CPC ...
Abstract

A deposited film forming apparatus has a power applying electrode disposed above a flat plate type base member grounded, in a vacuum chamber, and a power source for supplying a power to the power applying electrode, the deposited film forming apparatus being constructed to supply the power from the power source to the power applying electrode so as to generate a plasma in a discharge space between the power applying electrode and a substrate disposed in opposition to the power applying electrode in the vacuum chamber and serving as an electrode in a pair with the power applying electrode, thereby decomposing a source gas introduced into the vacuum chamber to form a deposited film on the substrate, wherein the power applying electrode is fixed to the base member with the power applying electrode being isolated from the base member.


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