Miyagi, Japan

Koichi Murakami

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignees: Tokyo Electron Limited, Nippon Tungsten Co., Ltd.. Active years: 2006-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichi Murakami. Retrieved from https://idiyas.com/inventor/koichi-murakami-22vvm02s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 85.7

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 20(Granted Patents)


Location History:

  • Nirasaki, JP (2011)
  • Yamanashi, JP (2006 - 2017)
  • Miyagi, JP (2022 - 2023)

Company Filing History:


Years Active: 2006-2023

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7 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Koichi Murakami in Plasma Processing Technology**

Introduction

Koichi Murakami, an inventor based in Miyagi, Japan, has made significant strides in the field of plasma processing technology. With a total of seven patents to his name, Murakami is recognized for his innovative approaches that enhance the efficiency and functionality of plasma processing apparatuses.

Latest Patents

Among Murakami's most notable patents are his advancements related to members for plasma processing apparatuses. His latest inventions include a member made from a tungsten carbide phase, which incorporates various atomic elements such as iron (Fe), cobalt (Co), and nickel (Ni). These innovations focus on optimal performance, with specifications detailing atom contents ranging from 30 to 3300 atomic parts per million. Additionally, he has developed a plasma processing apparatus that contains multiple phases, including various carbide, nitride, carbonitride, and composite carbide phases. These contributions underscore his dedication to advancing the technology used in the semiconductor industry.

Career Highlights

Koichi Murakami has had a distinguished career, working with prominent companies such as Tokyo Electron Limited and Nippon Tungsten Co., Ltd. His experience at these leading firms has undoubtedly shaped his expertise in plasma processing and invention.

Collaborations

Throughout his career, Murakami has collaborated with notable colleagues, including Daisuke Hayashi and Takashi Ikeda. These partnerships have facilitated the exchange of ideas and innovation, further propelling advancements in their field.

Conclusion

Koichi Murakami's contributions to plasma processing technology are invaluable. With his innovative patents and collaborations, he continues to influence the industry. His work not only enhances current technologies but also paves the way for future advancements in plasma processing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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