The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Jul. 21, 2004
Kazuya Nagaseki, Yamanashi, JP;
Tadashi Onishi, Yamanashi, JP;
Koichi Murakami, Yamanashi, JP;
Daisuke Hayashi, Yamanashi, JP;
Akiko Kamigori, Yamanashi, JP;
Minoru Honda, Yamanashi, JP;
Kazuya Nagaseki, Yamanashi, JP;
Tadashi Onishi, Yamanashi, JP;
Koichi Murakami, Yamanashi, JP;
Daisuke Hayashi, Yamanashi, JP;
Akiko Kamigori, Yamanashi, JP;
Minoru Honda, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.