Nirasaki, Japan

Tadashi Onishi


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 44(Granted Patents)


Location History:

  • Salem, MA (US) (2003)
  • Yamanashi, JP (2006)
  • Nirasaki, JP (2005 - 2012)

Company Filing History:


Years Active: 2003-2012

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6 patents (USPTO):Explore Patents

Title: The Innovations of Tadashi Onishi

Introduction

Tadashi Onishi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing, holding a total of 6 patents. His work focuses on enhancing the efficiency and effectiveness of substrate cleaning and processing systems.

Latest Patents

Onishi's latest patents include a substrate processing system and a substrate cleaning apparatus that features a jetting apparatus. This innovative system is designed to completely remove foreign matter from the rear surface or periphery of a substrate. The substrate processing apparatus performs predetermined processing on the substrate, while the cleaning apparatus ensures that the substrate is cleaned before and after this processing. The jetting apparatus is capable of delivering a cleaning substance in both gas and liquid phases, along with a high-temperature gas, to effectively clean the substrate.

Another notable patent is a method of processing an organic film. This method involves coating a polar liquid film or forming an inorganic film on the surface of an organic film that has been applied to a substrate. The process includes curing the organic film by irradiating it with electron beams in a rare gas atmosphere, which enhances its affinity for the polar liquid or inorganic film.

Career Highlights

Tadashi Onishi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this company has allowed him to develop and refine his innovative ideas, contributing to advancements in substrate processing technology.

Collaborations

Throughout his career, Onishi has collaborated with notable colleagues such as Minoru Honda and Manabu Hama. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Tadashi Onishi's contributions to substrate processing and cleaning technologies have made a significant impact in the industry. His innovative patents and collaborative efforts continue to push the boundaries of what is possible in this field.

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