The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Oct. 24, 2001
Applicant:
Inventors:
Richard J. Freeman, Wenham, MA (US);
Jay R. Wallace, Danvers, MA (US);
Yoichi Kurono, South Hamilton, MA (US);
Arthur H. Laflamme, Jr., Rowley, MA (US);
Louise Smith Barriss, North Reading, MA (US);
Tadashi Onishi, Salem, MA (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
The present invention provides an etching system having a plurality of etching chambers ( ) disposed about a transfer chamber ( ), wherein the etching chambers are adapted to be selectively mounted at different positions with respect to the transfer chamber.