The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2007

Filed:

Dec. 29, 2003
Applicants:

Tadashi Onishi, Nirasaki, JP;

Manabu Hama, Nirasaki, JP;

Minoru Honda, Nirasaki, JP;

Kazuyuki Mitsuoka, Nirasaki, JP;

Mitsuaki Iwashita, Nirasaki, JP;

Inventors:

Tadashi Onishi, Nirasaki, JP;

Manabu Hama, Nirasaki, JP;

Minoru Honda, Nirasaki, JP;

Kazuyuki Mitsuoka, Nirasaki, JP;

Mitsuaki Iwashita, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a thin film processing method and system, a film thickness is regulated by using electron beams irradiated from a plurality of electron beam tubes onto a film of varying thickness formed on an object to be processed, wherein the output powers or beam irradiation times of the electron beam tubes are individually controlled according to a distribution of the thickness. In the method and system, electric charges charged in a film of an object to be processed can be removed also.


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