The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Dec. 04, 2003
Kazuyuki Mitsuoka, Nirasaki, JP;
Tadashi Onishi, Nirasaki, JP;
Minoru Honda, Nirasaki, JP;
Ryuichi Asako, Nirasaki, JP;
Mitsuaki Iwashita, Nirasaki, JP;
Kazuyuki Mitsuoka, Nirasaki, JP;
Tadashi Onishi, Nirasaki, JP;
Minoru Honda, Nirasaki, JP;
Ryuichi Asako, Nirasaki, JP;
Mitsuaki Iwashita, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing method according to the present invention coats a polar liquid film or forms an inorganic film on a surface of an organic film formed on a substrate as a protective film. The processing method comprises a modifying step of curing an organic film by irradiating the organic film with electron beams by means of an electron-beam irradiation device in a rare gas atmosphere, and an applying step of applying a polar liquid to the modified surface of the organic film or a film forming step of forming an inorganic film on the organic film. The organic film is cured and affinity for the polar liquid or the inorganic film is imparted to the organic film.