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For the Inventor, By the Inventor

Hwaseong-si, South Korea

Ki-Yeon Park

USPTO Granted Patents = 22 

Average Co-Inventor Count = 5.1

ph-index = 5

Forward Citations = 151(Granted Patents)


Location History:

  • Kyungki-do, KR (2005)
  • Yongin, KR (2006)
  • Seoul-si, KR (2006)
  • Yongin-si, KR (2009 - 2011)
  • Gyeonggi-do, KR (2009 - 2016)
  • Hwaseong-si, KR (2012 - 2020)

Company Filing History:

goldMedal22 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2005-2020

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22 patents (USPTO):Explore Patents
1. 10797160 - Methods of fabricating semiconductor devices (2020-10-06),
2. 10685957 - Semiconductor devices and methods of manufacturing the same (2020-06-16),
3. 10541127 - Material layers, semiconductor devices including the same, and methods of fabricating material layers and semiconductor devices (2020-01-21),
4. 10529555 - Methods of fabricating a SiOCN layer using a first and second carbon precursor, the first carbon precursor being different from the second carbon precursor (2020-01-07),
5. 10460927 - Methods of fabricating a SiOCN layer using a first and second carbon precursor, the first carbon precursor being different from the second carbon precursor (2019-10-29),
6. 10096688 - Integrated circuit device and method of manufacturing the same (2018-10-09),
7. 10026736 - Semiconductor devices and methods of manufacturing the same (2018-07-17),
8. 9859393 - Integrated circuit device and method of fabricating the same (2018-01-02),
9. 9685450 - Semiconductor devices and methods of fabricating the same (2017-06-20),
10. 9559185 - Semiconductor devices and methods of manufacturing the same (2017-01-31),
11. 9324781 - Semiconductor devices and methods of fabricating the same (2016-04-26),
12. 9247403 - Method and apparatus for filtering a mobile high-definition link signal (2016-01-26),
13. 9059331 - Semiconductor devices and methods of fabricating the same (2015-06-16),
14. 8723250 - Integrated circuit devices including complex dielectric layers and related fabrication methods (2014-05-13),
15. 8258064 - Methods of forming a metal silicate layer and methods of fabricating a semiconductor device including the metal silicate layer (2012-09-04),

Title: Innovator Spotlight: Ki-Yeon Park and His Contributions to Semiconductor Technologies

Introduction: Ki-Yeon Park, based in Hwaseong-si, South Korea, has made significant strides in the field of semiconductor device fabrication. With an impressive portfolio of 22 patents, he showcases his dedication to pushing the boundaries of technology and innovation within the electronics industry. He is currently affiliated with Samsung Electronics Co., Ltd., where he focuses on developing advanced semiconductor technologies.

Latest Patents: Among his latest patents, two stand out due to their innovative approaches in semiconductor fabrication. The first patent, titled "Methods of Fabricating Semiconductor Devices," outlines a comprehensive method involving the formation of a fin structure on a substrate, the creation of an interface film of varying thicknesses using different processes, and the densification of the gate dielectric film. Notably, the method allows for a first thickness of the interface film to remain unchanged after densifying the gate dielectric film.

The second patent, "Semiconductor Devices and Methods of Manufacturing the Same," details a semiconductor device that incorporates an active fin on a substrate, complete with a gate structure and a gate spacer structure. This innovative design features a stacked configuration that includes a wet etch stop pattern, an oxygen-containing silicon pattern, and a gas prevention pattern, all strategically placed to enhance device performance.

Career Highlights: Ki-Yeon Park has dedicated his career to the development of semiconductor technologies, contributing significantly to modern advancements in the field. His role at Samsung Electronics Co., Ltd. allows him to collaborate with leading experts and researchers, further enriching his experience and knowledge.

Collaborations: Throughout his career, Ki-Yeon has had the opportunity to collaborate with esteemed colleagues, including Yong-Suk Tak and Bon-Young Koo. Together, they have worked on projects that prioritize innovation, efficiency, and reliability in semiconductor manufacturing.

Conclusion: Ki-Yeon Park represents the spirit of innovation within the semiconductor industry. With numerous patents under his belt and a commitment to enhancing technology, he is poised to make even greater contributions in the future. His work at Samsung Electronics Co., Ltd. continues to inspire fellow inventors and establish new standards in semiconductor fabrication.

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