Gyeonggi-do, South Korea

Ki-Hong Lee

This inventor holds 16 USPTO granted patents and 4 published patent applications, primarily in Nonvolatile Memory Devices. Top assignees: Hynix Semiconductor Inc., Skhynix Inc.. Active years: 2011-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ki-Hong Lee. Retrieved from https://idiyas.com/inventor/ki-hong-lee-qoc3a9jg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 93.8

Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 117(Granted Patents)


Location History:

  • Icheon-si, KR (2013 - 2014)
  • Gyeonggi-do, KR (2011 - 2016)
  • Suwon-si, KR (2021 - 2023)

Company Filing History:


Years Active: 2011-2023

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Areas of Expertise:
Nonvolatile Memory Device
Semiconductor Fabrication
Pipe Gate Technology
3D Memory Device
Vertical Channel Memory
Memory Device Method
Nonvolatile Device Design
Memory Fabrication Techniques
Non-volatile Technology
Device Architecture
Memory Cell Structure
16 patents (USPTO):Explore Patents

Title: Ki-Hong Lee: Innovator in Semiconductor Fabrication

Introduction

Ki-Hong Lee is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 16 patents. His innovative methods have advanced the fabrication processes used in semiconductor devices.

Latest Patents

One of Ki-Hong Lee's latest patents is a method for fabricating a semiconductor device. This method includes forming a through-hole that penetrates through an alternating stack pattern and creating a gap-fill layer. A sacrificial gap-fill layer fills the through-hole, and a mask layer is formed over the alternating stack pattern and the gap-fill layer. This mask layer features a self-aligned opening that overlaps the filled through-hole and a portion of the uppermost material layer of the alternating stack pattern. The process further includes forming a first contact hole through the alternating stack pattern by performing a single etch, utilizing both the mask layer and the uppermost material layer as etch barriers to remove the sacrificial gap-fill layer.

Career Highlights

Ki-Hong Lee has worked with notable companies in the semiconductor industry, including Hynix Semiconductor Inc. and SK Hynix Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Ki-Hong Lee has collaborated with talented individuals such as Kwon Hong and Moon-Sig Joo. These partnerships have fostered innovation and have been instrumental in the development of his patented methods.

Conclusion

Ki-Hong Lee's contributions to semiconductor fabrication are noteworthy, and his patents reflect his expertise and innovative spirit. His work continues to influence the industry and pave the way for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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