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For the Inventor, By the Inventor

Poughquag, NY, United States of America

Kenneth T Settlemyer, Jr

This inventor holds 26 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignees: International Business Machines Corporation, Infineon Technologies Ag, Infineon Technologies North America Corp.. Active years: 2003-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenneth T Settlemyer, Jr. Retrieved from https://idiyas.com/inventor/kenneth-t-settlemyer-jr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26

% Patents Active = 26.9

Average Co-Inventor Count = 3.9

ph-index = 8

Forward Citations = 421(Granted Patents)


Location History:

  • Bradeonton, FL (US) (2009)
  • Bradenton, FL (US) (2008 - 2013)
  • Poughquag, NY (US) (2003 - 2016)

Company Filing History:

goldMedal25 out of 166,325 
 
International Business Machines Corporation
 patents
silverMedal4 out of 15,023 
 
Infineon Technologies Ag
 patents
bronzeMedal3 out of 244 
 
Infineon Technologies North America Corp.
 patents
4. 1 out of 5,671 
 
Globalfoundries Inc.
 patents
where one patent can have more than one assignee

Years Active: 2003-2016

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Areas of Expertise:
Trench Capacitors
Optical Proximity Correction
Anisotropic Wet Etch
Selective Etching
FinFets
Capacitance Enhancement
Crystallographic Etching
Device Fabrication
Mask Deviations
Parallel Data Processing
Substrate Drying
26 patents (USPTO):Explore Patents
1. 9472402 - Methods and structures for protecting one area while processing another area on a chip (2016-10-18),
2. 9059000 - Methods and structures for protecting one area while processing another area on a chip (2015-06-16),
3. 8577489 - Diagnosing in-line critical dimension control adjustments using optical proximity correction verification (2013-11-05),
4. 8499260 - Optical proximity correction verification accounting for mask deviations (2013-07-30),
5. 7696539 - Device fabrication by anisotropic wet etch (2010-04-13),
6. 7670901 - Method of fabricating a bottle trench and a bottle trench capacitor (2010-03-02),
7. 7666741 - Corner clipping for field effect devices (2010-02-23),
8. 7563670 - Method for etching single-crystal semiconductor selective to amorphous/polycrystalline semiconductor and structure formed by same (2009-07-21),
9. 7497959 - Methods and structures for protecting one area while processing another area on a chip (2009-03-03),
10. 7434185 - Method and apparatus for parallel data preparation and processing of integrated circuit graphical design data (2008-10-07),
11. 7410844 - Device fabrication by anisotropic wet etch (2008-08-12),
12. 7390745 - Pattern enhancement by crystallographic etching (2008-06-24),
13. 7387930 - Method of fabricating a bottle trench and a bottle trench capacitor (2008-06-17),
14. 7157328 - Selective etching to increase trench surface area (2007-01-02),
15. 7138308 - Replacement gate with TERA cap (2006-11-21),

Title: Kenneth T Settlemyer, Jr: Innovator in Semiconductor Manufacturing

Introduction

Kenneth T Settlemyer, Jr, based in Poughquag, NY, has made significant contributions to the field of semiconductor manufacturing with a remarkable portfolio of 26 patents. His innovations focus on enhancing the efficiency and effectiveness of chip processing, ensuring better protection of semiconductor materials during fabrication.

Latest Patents

Among his latest inventions is a patented method and structure for protecting one area while processing another area on a chip. This invention provides an increased level of protection through a mask structure that exhibits enhanced robustness against semiconductor manufacturing processes. These masks can be selectively and controllably removed, facilitating refined processes regarding the underlying materials. The technology involves the use of TERA materials, which may undergo conversion or hydration, allowing them to be selectively etched using a mixture of hydrogen fluoride and a hygroscopic acid or organic solvent. Additionally, his work encompasses two-layer structures of either similar or dissimilar materials, catering to advancements in chip processing methods.

Career Highlights

Kenneth has held important positions in prominent companies, including IBM and Infineon Technologies AG. His extensive experience in these leading technology firms has positioned him at the forefront of semiconductor innovation.

Collaborations

Throughout his career, Kenneth has collaborated with notable professionals such as Kangguo Cheng and Ravikumar Ramachandran. These collaborations have fostered the exchange of ideas and advanced the development of cutting-edge semiconductor technologies.

Conclusion

Kenneth T Settlemyer, Jr stands out as a prominent inventor whose inventive approaches have significantly influenced the semiconductor industry. His ongoing contributions showcase the importance of innovation in technology and manufacturing processes, affirming his role as a key figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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