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For the Inventor, By the Inventor

Boise, ID, United States of America

Kelly T Hurley

This inventor holds 22 USPTO granted patents and 1 published patent application, primarily in Flash Memory Technology. Top assignees: Micron Technology Incorporated, Other. Active years: 1996-2007.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kelly T Hurley. Retrieved from https://idiyas.com/inventor/kelly-t-hurley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 81.8

Average Co-Inventor Count = 1.7

ph-index = 8

Forward Citations = 214(Granted Patents)


Company Filing History:

goldMedal21 out of 39,222 
 
Micron Technology Incorporated
 patents
silverMedal1 out of 834,513 
Other
 patents

Years Active: 1996-2007

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Areas of Expertise:
Flash Memory
Semiconductor Processing
Memory Cell
Oxidation Layer
Silicon Nitride
Self-Aligned Structures
Stacked Gate
Variable Temperature
Wafer Surface Area
Oxidation-Resistant Layer
Local Interconnect
Circuitry
22 patents (USPTO):Explore Patents
1. 7271435 - Modified source/drain re-oxidation method and system (2007-09-18),
2. 7271060 - Semiconductor processing methods (2007-09-18),
3. 7091087 - Optimized flash memory cell (2006-08-15),
4. 7037860 - Modified source/drain re-oxidation method and system (2006-05-02),
5. 6949792 - Stacked gate region of a memory cell in a memory device (2005-09-27),
6. 6808989 - Self-aligned floating gate flash cell system and method (2004-10-26),
7. 6790721 - Metal local interconnect self-aligned source flash cell (2004-09-14),
8. 6759708 - Stacked gate region of a nonvolatile memory cell for a computer (2004-07-06),
9. 6756268 - Modified source/drain re-oxidation method and system (2004-06-29),
10. 6706594 - Optimized flash memory cell (2004-03-16),
11. 6690051 - FLASH memory circuitry (2004-02-10),
12. 6674145 - Flash memory circuitry (2004-01-06),
13. 6653683 - Method and structure for an oxide layer overlying an oxidation-resistant layer (2003-11-25),
14. 6624022 - Method of forming FLASH memory (2003-09-23),
15. 6387777 - Variable temperature LOCOS process (2002-05-14),

Title: **The Innovative Contributions of Kelly T. Hurley in Semiconductor Technology**

Introduction

Kelly T. Hurley, based in Boise, Idaho, is a prolific inventor with an impressive portfolio of 22 patented inventions. His work has significantly contributed to the field of semiconductor processing, demonstrating creativity and technical expertise that has influenced the industry.

Latest Patents

Among his latest inventions are two noteworthy patents that focus on advancing semiconductor processing methods. The first patent addresses **semiconductor processing methods**, which include innovative ways to fabricate components of memory arrays and peripheral regions within semiconductor substrates. This method emphasizes the differentiation in performance characteristics between these components, achieved through a strategic approach to nitride-containing masking structures and thermal oxidation processes.

The second patent pertains to a **modified source/drain re-oxidation method and system**. This invention utilizes a phosphorous-doped oxide layer introduced prior to re-oxidation, thus enhancing control over the performance characteristics of semiconductor devices, such as flash memory. This method improves programming rates, erase rates, data retention, and self-aligned source resistance, making it a significant advancement in memory technology.

Career Highlights

Kelly T. Hurley's career includes significant tenure at Micron Technology Incorporated, where he applied his expertise in semiconductor technology and processing. His alignment with a major player in the industry has allowed him to contribute to cutting-edge advancements and foster innovation in semiconductor solutions.

Collaborations

Throughout his career, Kelly has collaborated with notable colleagues, including Graham Richard Wolstenholme and Paul J. Rudeck. These collaborations reflect a strong synergy in engineering and innovation, contributing to the success of their inventions and advancements in semiconductor technologies.

Conclusion

Kelly T. Hurley embodies the spirit of innovation in the semiconductor industry through his patents and collaborations. His contributions, particularly in novel semiconductor processing methods, demonstrate his commitment to advancing technology and shaping the future of memory devices. With a track record of successful patents, Hurley continues to be an influential figure in the realm of engineering and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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