Keiji Mita

Title: The Innovations of Keiji Mita

Introduction

Keiji Mita is a prominent inventor based in Gunma, Japan, known for his significant contributions to the field of semiconductor technology. With a total of nine patents to his name, Mita has made remarkable advancements that have influenced the design and manufacturing of semiconductor devices.

Latest Patents

Mita's latest patents include a semiconductor device and manufacturing method that focuses on reducing the size of semiconductor integrated circuits. This innovation suppresses the lateral extension of an isolation region during the thermal diffusion of impurities in a semiconductor substrate. His method involves the implantation of boron ions into an epitaxial layer to form a P-type impurity region, followed by the use of a fourth photoresist to implant phosphorus ions, creating adjacent N-type impurity regions. Additionally, he has developed a semiconductor device that includes a protection diode designed to prevent electrostatic breakdown, utilizing a low capacitance protection diode. This design eliminates the need for an occupation area of a Zener diode on the front surface of the semiconductor substrate, enhancing efficiency and performance.

Career Highlights

Throughout his career, Mita has worked with notable companies such as Sanyo Electric Co., Ltd. and Sanyo Semiconductor Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Mita has collaborated with esteemed colleagues, including Kentaro Ooka and Yasuhiro Tamada. These partnerships have fostered a creative environment that has led to the development of advanced semiconductor solutions.

Conclusion

Keiji Mita's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the industry, paving the way for future advancements in semiconductor devices.