Hamamatsu, Japan

Kazuhisa Yamamura

This inventor holds 25 USPTO granted patents and 1 published patent application and 6 EPO patents, primarily in Photodiode Technology. Top assignees: Hamamatsu-Photonics K.k., Hamamatsu Phonotics K.k., Japan Aerospace Exploration Agency. Active years: 2011-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhisa Yamamura. Retrieved from https://idiyas.com/inventor/kazuhisa-yamamura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 96.0

 

Average Co-Inventor Count = 3.3

ph-index = 9

Forward Citations = 214(Granted Patents)


Location History:

  • Shizuoka, JP (2018)
  • Hamamatsu, JP (2011 - 2022)

Company Filing History:


Years Active: 2011-2022

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Areas of Expertise:
Photodiode Array
Semiconductor Detector
Radiation Measurement
Energy Beam Detection
X-ray CT System
PET System
Light-Detecting Element
Radiation Detector
Photodiode Manufacturing
Photodetection Element
Channel Surrounding Part
25 patents (USPTO):Explore Patents

Title: **Kazuhisa Yamamura: A Pioneer in Semiconductor Innovations**

Introduction:

Kazuhisa Yamamura is an esteemed inventor based in Hamamatsu, Japan, with a notable portfolio of 25 patents. His contributions to the field of semiconductor manufacturing have significantly advanced technology, especially in energy beam detection elements. This article delves into his latest patents, career highlights, and collaborations with fellow innovators.

Latest Patents:

Kazuhisa Yamamura's latest patents showcase his expertise in semiconductor technologies. Among them are a **semiconductor wafer manufacturing method**, a **method of manufacturing a semiconductor energy beam detecting element**, and a **semiconductor wafer with a through-slit**. In the wafer design, a first virtual cutting line defines a chip portion that includes an energy ray sensitive region when viewed perpendicular to its main surface. The intriguing detail of his innovation includes that the shortest distance from a second virtual cutting line to the edge of a second semiconductor region is smaller than that from the first virtual cutting line. Additionally, the through-slit that penetrates the semiconductor wafer allows for advanced structural features that enhance performance in applications like detectors, PET systems, and X-ray CT systems.

Career Highlights:

Kazuhisa Yamamura has made significant contributions while working at renowned companies, notably **Hamamatsu Photonics K.K.** His work in these organizations has enabled the development of cutting-edge semiconductor technologies that are used in various high-tech applications today.

Collaborations:

Throughout his career, Yamamura has collaborated with talented professionals, including Terumasa Nagano and Kenichi Sato. These collaborations have helped foster a rich environment for innovation, leading to the development of groundbreaking technologies in the semiconductor field.

Conclusion:

Kazuhisa Yamamura stands out as a prominent figure in the semiconductor industry, with a strong portfolio of patents that exemplify innovation and technical mastery. His work has not only contributed to advancing semiconductor technologies but also serves as an inspiration for future inventors and researchers in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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