Yokohama, Japan

Katsuyuki Aoki

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 3.5

ph-index = 5

Forward Citations = 201(Granted Patents)


Location History:

  • Fukaya, JP (1999 - 2001)
  • Saitama-ken, JP (2003)
  • Honjo, JP (2004)
  • Tokyo, JP (1996 - 2009)
  • Kanagawa, JP (2019)
  • Yokohama Kanagawa, JP (2022)
  • Yokohama, JP (1997 - 2023)

Company Filing History:


Years Active: 1996-2025

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23 patents (USPTO):Explore Patents

Title: Katsuyuki Aoki: Innovating Silicon Nitride Technologies

Introduction

Katsuyuki Aoki is an accomplished inventor based in Yokohama, Japan, with a significant portfolio of 22 patents. His work primarily focuses on silicon nitride technologies, contributing valuable innovations to the fields of materials science and electronics.

Latest Patents

Among his latest patents, Aoki has developed a silicon nitride sintered body, silicon nitride substrate, and silicon nitride circuit board. The silicon nitride sintered body consists of silicon nitride crystal grains and a grain boundary phase, where dislocation defect portions exist within some of the crystal grains. Notably, the criteria for the percentage of silicon nitride crystal grains are outlined, indicating that at least 50% and not more than 100% of the grains in any sampled cross-section should have completely visible contours. Additionally, the silicon nitride substrate is optimized with a plate thickness ranging from 0.1 mm to 0.4 mm, which significantly enhances the temperature coefficient of transmission characteristics when used in silicon nitride circuit boards. Moreover, Aoki’s methods for evaluating dielectric losses demonstrate a strong performance across varying frequencies, ensuring low losses through precise engineering.

Career Highlights

Aoki has had a noteworthy career, having worked for prominent companies such as Toshiba Corporation and Toshiba Materials Co., Ltd. His contributions to these organizations have led to groundbreaking advancements in silicon nitride applications, solidifying his reputation in the industry.

Collaborations

Throughout his career, Katsuyuki Aoki has collaborated with esteemed colleagues, including Hisashi Chigusa and Michiyo Abe. Their joint efforts have propelled innovations in the manufacturing and application of silicon nitride materials, showcasing the strength of teamwork in the realm of scientific research.

Conclusion

Katsuyuki Aoki's dedication to innovating silicon nitride technologies has resulted in substantial advancements in materials science. With his impressive portfolio of patents and collaborations with leading professionals in the field, Aoki continues to influence the evolution of electronic materials with his cutting-edge inventions.

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