The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Dec. 10, 2020
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Toshiba Materials Co., Ltd., Yokohama, JP;

Inventors:

Katsuyuki Aoki, Yokohama Kanagawa, JP;

Kentaro Iwai, Yokohama Kanagawa, JP;

Takayuki Fukasawa, Yokohama Kanagawa, JP;

Jun Momma, Yokohama Kanagawa, JP;

Takashi Sano, Fujisawa Kanagawa, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 35/587 (2006.01); H01L 23/00 (2006.01); H01L 23/14 (2006.01); H01L 23/15 (2006.01); H01L 23/373 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
C04B 35/587 (2013.01); H01L 23/14 (2013.01); H01L 23/15 (2013.01); H01L 23/3735 (2013.01); H01L 23/3736 (2013.01); H05K 1/0306 (2013.01); C04B 2235/3873 (2013.01); C04B 2235/786 (2013.01); C04B 2235/85 (2013.01); C04B 2235/9607 (2013.01); H01L 24/48 (2013.01); H01L 24/73 (2013.01); H01L 2224/48091 (2013.01); H01L 2224/48137 (2013.01); H01L 2224/73265 (2013.01);
Abstract

In a silicon nitride sintered body including silicon nitride crystal grains and a grain boundary phase, dislocation defect portions exists inside at least some of the silicon nitride crystal grains. A percentage of a number of the at least some of the silicon nitride crystal grains among any 50 of the silicon nitride crystal grains having completely visible contours in any cross section or surface of the silicon nitride sintered body is not less than 50% and not more than 100%. It is favorable that a plate thickness of the silicon nitride substrate, in which the silicon nitride sintered body is used, is within the range not less than 0.1 mm and not more than 0.4 mm. The TCT characteristics can be improved by using the silicon nitride substrate in the silicon nitride circuit board.


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