Fujisawa, Japan

Takashi Sano

USPTO Granted Patents = 23 

 

Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 337(Granted Patents)


Location History:

  • Yokohama, JP (1990 - 2015)
  • Fujisawa, JP (2016 - 2019)
  • Fujisawa Kanagawa, JP (2020 - 2023)

Company Filing History:


Years Active: 1990-2025

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23 patents (USPTO):

Title: The Innovative Contributions of Takashi Sano: A Pioneer in Silicon Nitride Technologies

Introduction: Takashi Sano, based in Fujisawa, Japan, is a distinguished inventor with a remarkable portfolio of 22 patents. His contributions to the field of silicon nitride technologies have paved the way for advancements in various applications. This article delves into his latest patents, career highlights, and collaborations with other professionals in the industry.

Latest Patents: Among his latest innovations are patents focused on silicon nitride materials and their applications. These include a silicon nitride sintered body that incorporates silicon nitride crystal grains with dislocation defect portions. Notably, the invention emphasizes a specific percentage of these crystal grains having fully visible contours. Additionally, his patents cover a silicon nitride substrate with an optimal thickness range and a silicon nitride circuit board, which enhances TCT characteristics through innovative design. Another significant contribution is the method for manufacturing a ceramic copper circuit board, that integrates a ceramic substrate and copper parts engineered for improved bonding and performance.

Career Highlights: Throughout his career, Takashi Sano has made significant strides in materials science, particularly through his work at prominent companies such as Kabushiki Kaisha Toshiba and Toshiba Materials Co., Ltd. His developments in silicon nitride applications have earned him a prominent position within the industry and have led to numerous patents that reflect his inventive prowess.

Collaborations: Takashi has worked closely with notable colleagues, including Hiromasa Kato and Katsuyuki Aoki. Their collaborative efforts have further advanced the innovations in silicon nitride technologies and contributed to the realization of practical applications from their research and development endeavors.

Conclusion: Takashi Sano's innovative spirit and extensive patent portfolio showcase his significant contributions to silicon nitride technologies. His work has had a lasting impact on the field, and his collaborations with talented individuals only enhance the advancements being made in this area. As the landscape of material science continues to evolve, Takashi's inventions will undoubtedly remain at the forefront of innovation.

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