Yokohama, Japan

Kentaro Iwai

This inventor holds 3 USPTO granted patents and 7 published patent applications and 1 EPO patent. Top assignees: Kabushiki Kaisha Toshiba, Toshiba Materials Co., Ltd., Niterra Materials Co., Ltd.. Active years: 2022-2026.

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2026

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3 patents (USPTO):Explore Patents

Title: Kentaro Iwai: Innovator in Silicon Nitride Technology

Introduction

Kentaro Iwai is a prominent inventor based in Yokohama, Kanagawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon nitride technologies. With a total of 3 patents, Iwai's work has advanced the understanding and application of silicon nitride in various industries.

Latest Patents

Iwai's latest patents include innovations related to silicon nitride sintered bodies, substrates, and circuit boards. One of his notable inventions describes a silicon nitride sintered body that contains silicon nitride crystal grains and a grain boundary phase. This invention highlights the presence of dislocation defect portions within some of the silicon nitride crystal grains. The patent specifies that at least 50% of the silicon nitride crystal grains among any 50 visible contours in a cross-section must meet certain criteria. Additionally, the silicon nitride substrate, which utilizes this sintered body, is designed with a plate thickness ranging from 0.1 mm to 0.4 mm. Iwai's work also emphasizes the improvement of TCT characteristics when using the silicon nitride substrate in circuit boards.

Career Highlights

Throughout his career, Kentaro Iwai has worked with notable companies such as Toshiba Corporation and Toshiba Materials Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and contribute to innovative projects.

Collaborations

Iwai has collaborated with esteemed colleagues, including Katsuyuki Aoki and Takayuki Fukasawa. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Kentaro Iwai's contributions to silicon nitride technology exemplify his dedication to innovation in materials science. His patents reflect a deep understanding of the complexities involved in developing advanced materials for various applications. Iwai's work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
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