Moriyama, Japan

Katsuichi Kitagawa


Average Co-Inventor Count = 2.7

ph-index = 4

Forward Citations = 53(Granted Patents)


Location History:

  • Otsu, JA (1976)
  • Otsu, JP (1978 - 2010)
  • Moriyama, JP (1987 - 2019)

Company Filing History:


Years Active: 1976-2019

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7 patents (USPTO):Explore Patents

Title: Katsuichi Kitagawa: Innovator in Film Thickness Measurement Technology

Introduction

Katsuichi Kitagawa is a notable inventor based in Moriyama, Japan. He has made significant contributions to the field of film thickness measurement technology, holding a total of 7 patents. His work has advanced the understanding and measurement of semi-transparent films, which are crucial in various industrial applications.

Latest Patents

Among his latest patents, Kitagawa has developed a film thickness measurement device that utilizes the interference of light. This device comprises a light source, an imaging component, and a controller. The controller estimates unknown variables based on a specific formula, allowing for precise measurement of film thickness. Additionally, he has patented a method for measuring defect density in single crystals. This method involves etching the observation surface to form etch pits at each defect and calculating various depth metrics to determine the type of defects present.

Career Highlights

Throughout his career, Kitagawa has worked with prominent companies such as Toray Industries, Inc. and Toray Engineering Company, Limited. His experience in these organizations has allowed him to refine his expertise in film measurement technologies and contribute to innovative solutions in the industry.

Collaborations

Kitagawa has collaborated with notable colleagues, including Hidemitsu Ogawa and Takeaki Akatsuka. These partnerships have fostered a collaborative environment that has led to advancements in their respective fields.

Conclusion

Katsuichi Kitagawa's contributions to film thickness measurement technology and defect density analysis have established him as a key figure in his field. His innovative patents and collaborations reflect his commitment to advancing technology and improving measurement techniques.

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