The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 14, 2010

Filed:

Jan. 26, 2007
Applicants:

Masashi Sugiyama, Tokyo, JP;

Hidemitsu Ogawa, Otsu, JP;

Katsuichi Kitagawa, Otsu, JP;

Kazuyoshi Suzuki, Otsu, JP;

Inventors:

Masashi Sugiyama, Tokyo, JP;

Hidemitsu Ogawa, Otsu, JP;

Katsuichi Kitagawa, Otsu, JP;

Kazuyoshi Suzuki, Otsu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A reference plane is arranged in a posture obliquely tilted at an optional angle relative to a traveling direction of a light-beam, so that an interference fringe is generated from the reflected light-beams which are reflected from a target plane and the reference plane and, then, return on a single optical path. An image of the interference fringe is taken by a CCD camera to acquire intensity value data of each pixel. A phase of an interference fringe waveform is obtained for each pixel by a CPU by fitting the intensity value data to a model equation expressing the interference fringe waveform, where the intensity value data contain that of each pixel and those of the pixels in the vicinity of the relevant pixel, on assumption that DC components, AC amplitudes and phases of the interference fringe waveforms are respectively constant in the vicinity of the relevant pixel. The obtained phase is converted into a height to measure a surface profile.


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