Hidemitsu Ogawa

Title: Hidemitsu Ogawa: Innovator in Surface Profile Measurement

Introduction

Hidemitsu Ogawa is a notable inventor based in Otsu, Japan. He has made significant contributions to the field of surface profile measurement, holding 2 patents that showcase his innovative approaches.

Latest Patents

Ogawa's latest patents include a "Method for measuring surface profile" and an "Apparatus using the same." In his method, a reference plane is arranged at an oblique angle relative to the direction of a light beam. This setup generates interference fringes from reflected light beams, which are then captured by a CCD camera to acquire intensity value data for each pixel. A CPU processes this data to obtain the phase of the interference fringe waveform, which is then converted into height measurements for surface profiling. His surface profile measuring apparatus incorporates a white light source, a varying device for adjusting distances between surfaces, and a computing device for estimating characteristic functions from acquired interference light intensity values.

Career Highlights

Throughout his career, Ogawa has worked at the Tokyo Institute of Technology, where he has contributed to research and development in optical measurement technologies. His work has been instrumental in advancing methods for accurately measuring rugged profiles of object surfaces.

Collaborations

Ogawa has collaborated with notable individuals such as Katsuichi Kitagawa and Akira Hirabayashi, enhancing the impact of his research through teamwork and shared expertise.

Conclusion

Hidemitsu Ogawa's innovative work in surface profile measurement has led to significant advancements in the field. His patents reflect a deep understanding of optical technologies and their applications in precise measurements.