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For the Inventor, By the Inventor

Hitachinaka, Japan

Katsuhiro Sasada

USPTO Granted Patents = 23

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 87(Granted Patents)


Location History:

  • Katsuta, JP (1997)
  • Hitachinaka, JP (1997 - 2017)
  • Tokyo, JP (2019)

Company Filing History:

goldMedal21 out of 2,874 
 
Hitachi-high-technologies Corporation
 patents
silverMedal2 out of 42,485 
 
Hitachi, Ltd.
 patents
bronzeMedal1 out of 33 
 
Hitachi-science Systems, Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1997-2019

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23 patents (USPTO):
1. 10393509 - Pattern height measurement device and charged particle beam device (2019-08-27),
2. 10184790 - Pattern measurement method and pattern measurement device (2019-01-22),
3. 9671223 - Pattern dimension measurement method using electron microscope, pattern dimension measurement system, and method for monitoring changes in electron microscope equipment over time (2017-06-06),
4. 8362426 - Scanning electron microscope and image signal processing method (2013-01-29),
5. 8203504 - Image forming method and charged particle beam apparatus (2012-06-19),
6. 8188427 - Scanning electron microscope alignment method and scanning electron microscope (2012-05-29),
7. 8178836 - Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope (2012-05-15),
8. 8071961 - Charged particle beam apparatus (2011-12-06),
9. 7817105 - Image forming method and charged particle beam apparatus (2010-10-19),
10. 7745782 - Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope (2010-06-29),
11. 7626166 - Electron microscope (2009-12-01),
12. 7601974 - Charged particle beam apparatus (2009-10-13),
13. 7566892 - Electron beam apparatus and method for production of its specimen chamber (2009-07-28),
14. 7514683 - Scanning electron microscope (2009-04-07),
15. 7435958 - Electron beam apparatus and method for production of its specimen chamber (2008-10-14),

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