The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
May. 23, 2007
Hiroaki Mito, Hitachinaka, JP;
Katsuhiro Sasada, Hitachinaka, JP;
Kazuo Kato, Naka, JP;
Tomohiro Kudo, Hitachinaka, JP;
Tomonori Saeki, Yokosuka, JP;
Hiroaki Mito, Hitachinaka, JP;
Katsuhiro Sasada, Hitachinaka, JP;
Kazuo Kato, Naka, JP;
Tomohiro Kudo, Hitachinaka, JP;
Tomonori Saeki, Yokosuka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized.