The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2010

Filed:

Feb. 27, 2008
Applicants:

Tatsuaki Ishijima, Tokai, JP;

Katsuhiro Sasada, Hitachinaka, JP;

Ritsuo Fukaya, Hitachinaka, JP;

Inventors:

Tatsuaki Ishijima, Tokai, JP;

Katsuhiro Sasada, Hitachinaka, JP;

Ritsuo Fukaya, Hitachinaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G21K 7/00 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.


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