Company Filing History:
Years Active: 1997-2002
Title: Innovations of Jyh-Haur Wang
Introduction
Jyh-Haur Wang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on improving the performance and reliability of integrated circuits.
Latest Patents
One of his latest patents is titled "Preventing gate oxide damage by post poly definition implantation while gate mask is on." This method addresses the issue of gate oxide damage caused by post poly definition implantation. By implementing a mask layout during ion implantation, the antenna ratio correlatable to oxide damage can be reduced to nearly zero. This innovative approach involves covering all polysilicon electrodes with a photoresist mask, thereby minimizing the effective antenna ratio and enhancing the reliability of the semiconductor devices.
Another notable patent is "Ultra-shallow junction formation by novel process sequence for PMOSFET." This patent describes a new method for forming ultra-shallow junctions for PMOSFETs while mitigating short channel effects. The process involves a semiconductor substrate wafer with both NMOS and PMOS active areas, where gate electrodes are formed. The method ensures that p-type source/drain extensions are implanted without an annealing step, leading to improved performance in integrated circuit devices.
Career Highlights
Jyh-Haur Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have significantly contributed to advancements in semiconductor manufacturing processes.
Collaborations
Some of his notable coworkers include Carlos Hernando Diaz and Shun-Liang Hsu, who have collaborated with him on various projects within the semiconductor field.
Conclusion
Jyh-Haur Wang's contributions to semiconductor technology through his patents and innovative methods have made a lasting impact on the industry. His work continues to influence the development of more efficient and reliable integrated circuits.