Junya Nakatsuji

This inventor holds 12 USPTO granted patents and 5 published patent applications and 1 EPO patent. Top assignee: Central Glass Company, Limited. Active years: 2015-2024.

USPTO Granted Patents = 12 (Patent Applications = 5)

% Patents Active = 58.3

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)

Location History:

Saitama, JP (2017)
Fujimino, JP (2015 - 2024)

Company Filing History:

12 out of 1,010

Central Glass Company, Limited

patents

Years Active: 2015-2024

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11881400 - Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same (2024-01-23),

2. 11437237 - Silicon-containing layer-forming composition, and method for producing pattern-equipped substrate which uses same (2022-09-06),

3. 10087284 - Fluorine-containing polymerizable monomer and polymer compound using same (2018-10-02),

4. 9778569 - Positive photosensitive resin composition, method for producing film using same, and electronic component (2017-10-03),

5. 9758694 - Curable resin composition, cured product thereof, and semiconductor device using the same (2017-09-12),

6. 9638998 - Silane composition and cured film thereof, and method for forming negative resist pattern using same (2017-05-02),

7. 9550711 - Fluorine-containing polymerizable monomer and polymer compound using same (2017-01-24),

8. 9512272 - Curable composition containing silicone, and cured product thereof (2016-12-06),

9. 9464163 - Novolak resin containing hexafluoroisopropanol group, method for producing same, and composition of same (2016-10-11),

10. 9411231 - Silane composition and cured film thereof, and method for forming negative resist pattern using same (2016-08-09),

11. 9080017 - Siloxane-based composition and cured product thereof, and use therefor (2015-07-14),

12. 8981163 - Fluorine-containing aromatic compound and method for producing same (2015-03-17),

Title: Junya Nakatsuji: Innovator in Silicon-Containing Layer Technologies

Introduction

Junya Nakatsuji is a prominent inventor based in Fujimino, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon-containing layer-forming compositions. With a total of 12 patents to his name, Nakatsuji's work has had a substantial impact on various technological applications.

Latest Patents

One of Nakatsuji's latest patents is focused on a silicon-containing layer-forming composition that exhibits an anti-reflective function during exposure in a multilayer resist process. This composition is designed to show a high etching rate against a plasma of fluorine-based gas while maintaining a low etching rate against a plasma of oxygen-based gas. The formulation includes a polysiloxane compound characterized by a specific structural unit and a solvent, which enhances its effectiveness in various applications.

Career Highlights

Junya Nakatsuji is currently employed at Central Glass Company, Limited, where he continues to innovate and develop new materials. His expertise in silicon-containing compositions has positioned him as a key figure in the advancement of technologies related to semiconductor manufacturing and other high-tech industries.

Collaborations

Throughout his career, Nakatsuji has collaborated with notable colleagues, including Kazuhiro Yamanaka and Tsuyoshi Ogawa. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Junya Nakatsuji's contributions to the field of silicon-containing layer technologies exemplify the importance of innovation in advancing modern materials science. His ongoing work continues to influence various industries, showcasing the vital role of inventors in shaping the future.