The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2016

Filed:

Dec. 25, 2013
Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Junya Nakatsuji, Fujimino, JP;

Kazuhiro Yamanaka, Tachikawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 8/04 (2006.01); C08G 14/02 (2006.01); C08L 63/00 (2006.01); C08G 61/12 (2006.01); C09D 163/00 (2006.01); C08G 59/62 (2006.01); C08G 8/14 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08G 16/02 (2006.01); C09D 161/00 (2006.01); C09D 161/06 (2006.01); C08L 61/00 (2006.01); C08L 61/06 (2006.01); H05K 3/28 (2006.01);
U.S. Cl.
CPC ...
C08G 61/128 (2013.01); C08G 8/14 (2013.01); C08G 16/0225 (2013.01); C08G 59/62 (2013.01); C08L 61/00 (2013.01); C08L 61/06 (2013.01); C09D 161/00 (2013.01); C09D 161/06 (2013.01); C09D 163/00 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); H05K 3/287 (2013.01);
Abstract

Disclosed is a novolak resin containing a repeating unit represented by the general formula (1). Ris a hydrogen atom or an alkyl group which is Cstraight-chain or Cbranched-chain, and some or all hydrogen atoms in the alkyl group may be replaced with a fluorine atom; Ris a hydrogen atom, a phenyl group, an alkyl group which is Cstraight-chain or Cbranched-chain, or an alkyl group having a Ccyclic structure, and some or all hydrogen atoms in the phenyl group and the alkyl group may be replaced with fluorine atoms; each of a and b is independently an integer of 1-3, and these are defined as 2≦a+b≦4; and d is an integer of 0-2. This novolak resin has high dissolution rate in the alkaline development solution in addition to the heat resisting property which is a property of phenolic resin.


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