Tokyo, Japan

Kazuhiro Yamanaka

This inventor holds 60 USPTO granted patents and 28 published patent applications and 1 EPO patent, primarily in Ultrasonic Imaging (CPC class A61B). Top assignees: Central Glass Company, Limited, Fuji Photo Optical Co., Ltd., Hitachi, Ltd.. Active years: 1998-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhiro Yamanaka. Retrieved from https://idiyas.com/inventor/kazuhiro-yamanaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 60 

% Patents Active = 66.7

 

Average Co-Inventor Count = 3.1

ph-index = 12

Forward Citations = 561(Granted Patents)

Forward Citations (Not Self Cited) = 554(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Omiya, JP (1998 - 2004)
  • Kawagoe, JP (2006 - 2007)
  • Saitama, JP (2006 - 2008)
  • Kokubunji, JP (2011 - 2013)
  • San Jose, CA (US) (2014)
  • Tokyo, JP (2009 - 2023)
  • Tachikawa, JP (2014 - 2024)

Company Filing History:


Years Active: 1998-2025

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Areas of Expertise:
Ultrasonic Imaging
Image Processing
Silicon Composition
Gas Separation Membrane
Photosensitive Resin
Fluorine-Containing Polymer
Negative Resist Composition
Patterning Process
Ultrasonic CT Device
Ultrasonic Transmission
Polyamide Membranes
Fluorinated Compounds
60 patents (USPTO):Explore Patents

Title: Kazuhiro Yamanaka: A Pioneer in Silicon-Containing Innovations

Introduction: Kazuhiro Yamanaka, residing in Tokyo, Japan, has made significant strides in the field of materials science and ultrasonic technology. With a portfolio of 59 patents, he has established himself as an influential inventor whose work continues to impact various industries.

Latest Patents: Among Yamanaka's latest contributions are notable patents such as a silicon-containing layer-forming composition. This innovative composition plays a critical role in creating a layer that exhibits anti-reflective properties during exposure in multilayer resist processes. Notably, it demonstrates high etching rates against fluorine-based plasma while maintaining low etching rates against oxygen-based plasma. The formulation of this composition includes a polysiloxane compound with a specific structural unit, ensuring its effectiveness in advanced manufacturing processes.

Additionally, Yamanaka has developed a groundbreaking ultrasonic CT device designed to enhance reflection signal reception from objects in proximity to transducers. This device incorporates a transducer array and allows for transceivers to operate with fewer units than the number of transducers available. This unique approach facilitates efficient communication between the transducers and the connected receivers.

Career Highlights: Yamanaka has collaborated with esteemed companies throughout his career, including Central Glass Company, Limited and Fuji Photo Optical Co., Ltd. His innovations have been instrumental in pushing the boundaries of technology in these organizations, showcasing his commitment to progress in both materials and ultrasonic applications.

Collaborations: Throughout his career, Yamanaka has had the pleasure of working alongside talented individuals such as Mitsuru Higuchi and Junya Nakatsuji. These collaborations have further enriched his work, leading to the creation of innovative technologies and methodologies.

Conclusion: Kazuhiro Yamanaka stands out as a remarkable inventor whose contributions to the field of silicon-containing materials and ultrasonic technology continue to shape future advancements. His patents reflect a deep understanding of the complexities involved in modern engineering, and his collaborative work demonstrates the importance of teamwork in driving innovation. As technology evolves, Yamanaka's legacy will undoubtedly inspire future generations of inventors and researchers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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