Location History:
- Yamanashi-ken, JP (2000)
- Kofu, JP (1995 - 2001)
- Nirasaki, JP (2002 - 2007)
- Yamanashi, JP (2002 - 2011)
- Koshi, JP (2008 - 2022)
- Kumamoto, JP (2018 - 2022)
Company Filing History:
36 out of 10,326 
1 out of 101 
1 out of 13 Years Active: 1995-2022
Title: Innovations by Junichi Kitano: A Pioneer in Substrate Processing Technologies
Introduction: Junichi Kitano, based in Koshi, Japan, is a notable inventor recognized for his contributions to substrate processing technologies. With an impressive portfolio of 38 patents, Kitano has made significant strides in developing innovative apparatuses and methods that enhance the efficiency of substrate processing.
Latest Patents: Among his latest patents is the "Substrate Processing Apparatus and Processing Liquid Reuse Method." This patent describes a substrate processing apparatus that includes a processing tank, a reservoir, a remover, a mixer, and a return path. The system allows for the etching of a substrate by immersing it in a processing liquid containing a chemical liquid and silicon. The reservoir is crucial as it collects and stores the processing liquid discharged from the processing tank. The remover plays a vital role by recovering a portion of that liquid and eliminating silicone. The mixer then combines the recovered liquid with the processed liquid before it is returned to the processing tank via the return path.
Another recent invention by Kitano is the "Substrate Liquid Processing Apparatus." This device features a processing tub that holds the processing liquid where substrate processing occurs via immersion. It is equipped with a circulation line and a pump that generates a flow of the processing liquid, which returns to the tub after passing through the line. A heater warms the liquid, and two temperature sensors positioned in the circulation system help control the heater's output based on temperature readings.
Career Highlights: Kitano's professional journey includes working at prominent companies such as Tokyo Electron Limited, where he contributed to cutting-edge technology in electronics manufacturing. His innovations have positioned him as a key figure in the field of substrate processing.
Collaborations: Throughout his career, Kitano has collaborated with talented individuals such as Takayuki Katano and Yuji Matsuyama. These partnerships have likely propelled innovative breakthroughs in his projects and furthered advancements in substrate processing technologies.
Conclusion: Junichi Kitano's extensive patent portfolio and continuous innovation in substrate processing apparatuses underscore his importance in this sector. As the demand for sophisticated etching solutions grows, his inventions are poised to play a crucial role in shaping the future of substrate processing technologies.