The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2022
Filed:
Feb. 13, 2018
Tokyo Electron Limited, Tokyo, JP;
Takashi Nagai, Koshi, JP;
Hideaki Sato, Koshi, JP;
Junichi Kitano, Koshi, JP;
Kenji Goto, Koshi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate liquid processing apparatus includes a processing tubwhich is configured to store therein a processing liquid and in which a processing of a substrate is performed by immersing the substrate in the stored processing liquid; a circulation lineconnected to the processing tub; a pumpprovided at the circulation line and configured to generate a flow of the processing liquid flowing out from the processing tub and returning back to the processing tub after passing through the circulation line; and a heaterprovided at the circulation line and configured to heat the processing liquid. At least two temperature sensorstoare provided at different positions within a circulation system including the processing tub and the circulation line. Controllersandcontrol a heat generation amount of the heater based on detection temperatures of the at least two temperature sensors.