The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2011
Filed:
Dec. 18, 2007
Hideharu Kyouda, Koshi, JP;
Junichi Kitano, Koshi, JP;
Osamu Miyahara, Koshi, JP;
Kenji Tsutsumi, Koshi, JP;
Hideharu Kyouda, Koshi, JP;
Junichi Kitano, Koshi, JP;
Osamu Miyahara, Koshi, JP;
Kenji Tsutsumi, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In the present invention, a plurality of rounds of patterning are performed on a substrate. In a patterning system, the substrate on which a first round of patterning has been performed is transferred to a planarizing film forming unit, where a planarizing film is formed above the substrate. The substrate is then transferred to the patterning system and subjected to a second round of patterning. The time from the completion of the forming processing of the planarizing film to the start of the second round of patterning is managed to be constant among the substrates. According to the present invention, in the pattern forming processing of performing a plurality of rounds of patterning, a pattern with a desired dimension can be stably formed above the substrate.