The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Dec. 18, 2007
Hisashi Kawano, Koshi, JP;
Junichi Kitano, Koshi, JP;
Hitoshi Kosugi, Koshi, JP;
Koichi Hontake, Koshi, JP;
Masashi Enomoto, Koshi, JP;
Hisashi Kawano, Koshi, JP;
Junichi Kitano, Koshi, JP;
Hitoshi Kosugi, Koshi, JP;
Koichi Hontake, Koshi, JP;
Masashi Enomoto, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A coating/developing apparatus includes a process section including processing units to perform a series of processes for resist coating and development; an interface section disposed between the process section and immersion light exposure apparatus; and a drying section disposed in the interface section to dry the substrate immediately after the immersion light exposure process. The drying section includes a process container configured to accommodate the substrate, a substrate support member configured to place the substrate thereon, a temperature-adjusted gas supply mechanism configured to supply a temperature-adjusted gas into the process container, and an exhaust mechanism configured to exhaust the process container. The drying section is arranged to dry the substrate by supplying the temperature-adjusted gas into the process container with the substrate placed on the substrate support member, while exhausting the process container.