Jung-Tao Chung

Title: Innovations of Jung-Tao Chung

Introduction

Jung-Tao Chung is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work focuses on innovative semiconductor structures that enhance device performance and reliability.

Latest Patents

Among his latest patents, Jung-Tao Chung has developed a semiconductor structure that includes a substrate, an active device, and a passive device positioned over the substrate. In this design, the active device is located in a first region of the substrate, while the passive device is situated in a second region. The structure also features a shielding structure and a passivation layer. The shielding structure consists of a barrier layer and a ceiling layer, with the barrier layer positioned on both the passive and active devices. The passivation layer is located beneath the barrier layer, covering the top surface of the passive device. An air cavity is defined by the sidewalls of the barrier layer, the bottom surface of the ceiling layer, and the substrate. Another patent describes a similar semiconductor structure, emphasizing the arrangement of the active and passive devices and the importance of the passivation layer in exposing the active device.

Career Highlights

Jung-Tao Chung is currently employed at Win Semiconductors Corp., where he continues to innovate in the semiconductor industry. His expertise and dedication have led to advancements that benefit various applications in electronics.

Collaborations

He has collaborated with notable colleagues, including Chia-Ming Chang and Yan-Cheng Lin, contributing to a dynamic research environment that fosters innovation.

Conclusion

Jung-Tao Chung's work in semiconductor technology exemplifies the impact of innovative thinking in the field. His patents reflect a commitment to enhancing device functionality and performance.