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Jun Takayasu

USPTO Granted Patents = 15 (Patent Applications = 1)

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 80(Granted Patents)

Location History:

Kanagawa-ken, JP (1999)
Kawasaki, JP (1999 - 2004)
Mie-ken, JP (2014)
Yokkaichi, JP (2005 - 2019)

Company Filing History:

10 out of 52,735

Kabushiki Kaisha Toshiba

patents

4 out of 2,955

Toshiba Memory Corporation

patents

1 out of 832,843

Other

patents

Years Active: 1999-2019

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10441979 - Cleaning apparatus and cleaning method (2019-10-15),

2. 10249518 - Polishing device and polishing method (2019-04-02),

3. 9947555 - Semiconductor manufacturing apparatus and method of manufacturing semiconductor device (2018-04-17),

4. 9902038 - Polishing apparatus, polishing method, and semiconductor manufacturing method (2018-02-27),

5. 9539696 - Retainer ring, polish apparatus, and polish method (2017-01-10),

6. 9502318 - Polish apparatus, polish method, and method of manufacturing semiconductor device (2016-11-22),

7. 9296083 - Polishing apparatus and polishing method (2016-03-29),

8. 8823079 - Semiconductor device and method for manufacturing same (2014-09-02),

9. 7037839 - Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry (2006-05-02),

10. 6878631 - Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive (2005-04-12),

11. 6723226 - Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus (2004-04-20),

12. 6354913 - Abrasive and method for polishing semiconductor substrate (2002-03-12),

13. 6098638 - Method of manufacturing a semiconductor device and an apparatus for (2000-08-08),

14. 6007696 - Apparatus and method for manufacturing electrolytic ionic water and (1999-12-28),

15. 6001238 - Method for purifying pure water and an apparatus for the same (1999-12-14),

Title: Jun Takayasu: Innovator in Cleaning and Polishing Technologies

Introduction

Jun Takayasu is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the fields of cleaning and polishing technologies, holding a total of 15 patents. His innovative approaches have led to advancements that enhance efficiency and effectiveness in various applications.

Latest Patents

Among his latest patents, Takayasu has developed a cleaning apparatus and method. This apparatus includes a substrate cleaner designed to operate over a first region opposite a substrate and a second region that differs from the first. Additionally, he has created a polishing device that features a stage for holding a wafer, a polishing part for treating a film on the wafer's circumferential edge, and a detector that identifies any residual film. This device is controlled by a system that adjusts the polishing based on the detected state of the circumferential edge.

Career Highlights

Throughout his career, Jun Takayasu has worked with notable companies, including Toshiba Corporation and Toshiba Memory Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the industry.

Collaborations

Takayasu has collaborated with several talented individuals, including Naoto Miyashita and Dai Fukushima. These partnerships have fostered a creative environment that has led to innovative solutions in their respective fields.

Conclusion

Jun Takayasu's work in cleaning and polishing technologies exemplifies the spirit of innovation. His patents and collaborations reflect a commitment to advancing technology and improving processes in the industry.

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