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For the Inventor, By the Inventor

Suwon-si, South Korea

Jun-Hyun Cho

USPTO Granted Patents = 14

Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 49(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2010)
  • Suwon-si, KR (2007 - 2012)
  • Hwaseong-si, KR (2016)

Company Filing History:

goldMedal14 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2007-2016

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14 patents (USPTO):
1. 9425059 - Methods of forming a pattern and methods of manufacturing a semiconductor device using the same (2016-08-23),
2. 8268397 - Organometallic precursor, thin film having the same, metal wiring including the thin film, method of forming a thin film and method of manufacturing a metal wiring using the same (2012-09-18),
3. 8138057 - Metal oxide alloy layer, method of forming the metal oxide alloy layer, and methods of manufacturing a gate structure and a capacitor including the metal oxide alloy layer (2012-03-20),
4. 7732297 - Method of manufacturing an insulating layer and method of manufacturing a semiconductor device using the insulating layer (2010-06-08),
5. 7648854 - Methods of forming metal oxide layers, methods of forming gate structures using the same, and methods of forming capacitors using the same (2010-01-19),
6. 7642200 - Methods of forming a thin film and methods of manufacturing a capacitor and a gate structure using the same (2010-01-05),
7. 7605094 - Method of forming metal oxide using an atomic layer deposition process (2009-10-20),
8. 7582573 - Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same (2009-09-01),
9. 7517815 - Spin-on glass composition, method of preparing the spin-on glass composition and method of forming a porous silicon oxide layer using the spin-on glass composition (2009-04-14),
10. 7488684 - Organic aluminum precursor and method of forming a metal wire using the same (2009-02-10),
11. 7452569 - Organic aluminum precursor and method of manufacturing a metal wiring using the same (2008-11-18),
12. 7427573 - Forming composite metal oxide layer with hafnium oxide and titanium oxide (2008-09-23),
13. 7270886 - Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same (2007-09-18),
14. 7250379 - Method of forming metal oxide using an atomic layer deposition process (2007-07-31),

Title: Jun-Hyun Cho: Pioneering Innovations in Semiconductor Technology

Introduction: Jun-Hyun Cho, a visionary inventor based in Suwon-si, South Korea, is a driving force in the tech industry with a passion for innovation and excellence. With a remarkable 14 patents under his belt, Cho continues to push boundaries in the ever-evolving world of technology.

Latest Patents: Among his latest patents is a groundbreaking method of forming a pattern in semiconductor devices. This process involves utilizing extreme ultraviolet (EUV) light to create photoresist patterns for etching target layers, showcasing Cho's expertise in cutting-edge techniques. Another innovative patent involves an organometallic precursor for semiconductor manufacturing, emphasizing stability and efficiency in the production of thin films and metal wirings.

Career Highlights: Cho's prolific career is primarily rooted in his role at Samsung Electronics Co., Ltd., a global leader in the tech industry. Through his work, Cho has cemented his legacy as a visionary inventor, driving advancements in semiconductor technologies that have a lasting impact on the field.

Collaborations: In his journey of innovation, Cho has collaborated with esteemed colleagues such as Jung-Ho Lee and Jung-Sik Choi. Together, they have contributed to groundbreaking research and development projects, further solidifying Cho's position as a key player in the industry.

Conclusion: Jun-Hyun Cho's relentless pursuit of excellence and passion for innovation have established him as a trailblazer in the field of semiconductor technology. With a stellar track record of patents and a collaborative spirit, Cho continues to inspire and shape the future of technology with his pioneering inventions.

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