Pyeongtaek-si, South Korea

Jun Ha Hwang

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Pyeongtaek-si, KR (2018 - 2019)
  • Anseong-si, KR (2022)
  • Gyeonggi-do, KR (2022 - 2024)

Company Filing History:


Years Active: 2018-2025

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8 patents (USPTO):

Title: The Innovative Mind of Jun Ha Hwang

Introduction

Jun Ha Hwang, an accomplished inventor based in Pyeongtaek-si, South Korea, has made significant contributions to the field of polishing slurry compositions. With a remarkable portfolio of seven patents, Hwang has demonstrated his expertise in developing solutions that enhance various manufacturing processes.

Latest Patents

Among his latest innovations are two notable patents. The first is a "Polishing Slurry Composition and Method for Producing Same," which outlines a polishing slurry that comprises abrasive particles with positively-charged surfaces, along with a unique combination of dispersants. This composition is rigorously defined by specific parameters that ensure optimal performance in polishing applications. The second patent, "Polishing Slurry Composition for STI Process," focuses on a specialized polishing solution containing distinctive additives designed to improve the efficiency of silicon film polishing. Both patents underscore Hwang's ability to blend chemistry and engineering to solve complex challenges in the semiconductor industry.

Career Highlights

Hwang's career includes tenures at prominent companies, notably K.C. Tech Co., Ltd. and Samsung Electronics Co., Ltd. His work at these organizations has allowed him to refine his skills and drive innovations that are critical to technological advancements in the electronics sector.

Collaborations

Throughout his career, Hwang has collaborated with talented professionals, including his coworkers Sung Pyo Lee and Chang Gil Kwon. These partnerships have enhanced his ability to innovate and have contributed to the successful development of his patented technologies.

Conclusion

In conclusion, Jun Ha Hwang exemplifies the spirit of innovation in the field of polishing slurry compositions. His patents not only reflect his expertise but also his commitment to advancing technology in semiconductor manufacturing. As he continues to drive innovations, Hwang’s contributions will undoubtedly shape the future of this industry.

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