The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2022
Filed:
Nov. 13, 2018
Applicant:
Kctech Co., Ltd., Gyeonggi-do, KR;
Inventors:
Hae Won Yang, Seoul, KR;
Jun Ha Hwang, Gyeonggi-do, KR;
Jung Yoon Kim, Gyeonggi-do, KR;
Kwang Soo Park, Gyeonggi-do, KR;
Assignee:
KCTECH CO., LTD., Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); H01L 21/3212 (2013.01);
Abstract
The present invention relates to a polishing slurry composition for an STI process, the polishing slurry composition comprising: a polishing solution including polishing particles; and an additive solution containing a nitride film polishing barrier inclusive of a polymer having an amide bond.
Quick Actions:
Yang, Hae. (2022). Polishing slurry composition for sti process (U.S. Patent No. 11384255). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11384255
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile