The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
Jul. 11, 2019
Applicant:
Kctech Co., Ltd., Gyeonggi-do, KR;
Inventors:
Jung Yoon Kim, Gyeonggi-do, KR;
Jun Ha Hwang, Gyeonggi-do, KR;
Kwang Soo Park, Gyeonggi-do, KR;
Hae Won Yang, Seoul, KR;
Assignee:
KCTECH CO., LTD., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01);
Abstract
The present disclosure relates to a polishing slurry composition for an STI process and, more specifically, to a polishing slurry composition for an STI process, the polishing slurry composition comprising: a polishing solution including polishing particles; and an additive solution containing a polymer having an amide bond, and a polysilicon film polishing barrier inclusive of a monomer having three or more chains linked to one or more atoms.