Company Filing History:
1 out of 41 
1 out of 7 
3 out of 832,718 Years Active: 2017-2021
Title: Innovations of Julien Vitiello
Introduction
Julien Vitiello is a notable inventor based in Grenoble, France. He has made significant contributions to the field of materials science and chemical vapor deposition. With a total of five patents to his name, Vitiello's work focuses on advanced methods for depositing insulating materials and producing interconnections in substrates.
Latest Patents
One of Vitiello's latest patents is a method for depositing an insulating material into a via. This method involves the gas-phase injection of a first chemical species with a precursor of the insulating material into a deposition chamber. It utilizes a first injection path and a first pulse sequence, along with a second gas-phase injection of a second chemical species that reacts with the precursor. The process includes generating plasma from both high frequency and low frequency sources, ensuring a specific power ratio. Another significant patent is a method for producing an interconnection that includes a via extending through a substrate. This method involves the deposition of titanium nitride or tantalum nitride on the substrate's surface, followed by the deposition of copper and filling the hole with copper. The process is characterized by the dephased injection of precursors and reactive gases.
Career Highlights
Throughout his career, Julien Vitiello has worked with various companies, including Plasma-Therm, Inc. His expertise in chemical vapor deposition and materials science has positioned him as a key figure in the development of innovative technologies.
Collaborations
Vitiello has collaborated with notable professionals in his field, including Fabien Piallat and Jean-Luc Delcarri. These collaborations have contributed to the advancement of his research and the successful implementation of his patented methods.
Conclusion
Julien Vitiello's contributions to the field of materials science and his innovative patents highlight his role as a leading inventor. His work continues to influence advancements in chemical vapor deposition and substrate interconnections.
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