Judy H Huang

Title: Innovations of Judy H. Huang: A Pioneer in Plasma Processing Technologies

Introduction

Judy H. Huang is a prominent inventor based in Los Gatos, California, recognized for her remarkable contributions to the fields of plasma processing and dielectric materials. With an impressive portfolio of 52 patents, she has made significant advancements that continue to shape the industry.

Latest Patents

Among her latest inventions is the "Inductive/Capacitive Hybrid Plasma Source and System with Such Chamber," which features a sophisticated plasma processing chamber that employs both capacitive and inductive coupling of RF power. This technology incorporates a variable capacitor to regulate the power distribution between an inductive coil and a top electrode, enhancing precision in processing substrates. Furthermore, the substrate is securely held using DC power without RF bias, allowing for a seamless operation within a movable chuck system that optimally handles substrates throughout the processing stages.

Another notable patent is the "Flowable Film Dielectric Gap Fill Process," which outlines innovative methods for applying a solid dielectric material to fill gaps on substrates. This process is marked by its capability to create a flowable film that ensures a consistent and void-free fill, transforming into solid dielectric material after application. The method utilizes a dielectric precursor reacting with an oxidant, which enhances the efficiency of gap filling in various substrates.

Career Highlights

Judy's career includes significant tenures at leading technology firms, such as Applied Materials, Inc. and Novellus Systems Incorporated. Her work in these organizations has established her reputation as a leader in developing cutting-edge technologies that both improve and innovate processing techniques in the semiconductor industry.

Collaborations

Throughout her career, Judy H. Huang has collaborated with esteemed colleagues, including David Wingto Cheung and Chi-I Lang. These partnerships have enabled her to leverage collective expertise, fostering a collaborative environment conducive to impactful inventions and research.

Conclusion

Judy H. Huang's work exemplifies the dynamic intersection of science and technology. Her persistent dedication to innovation continues to influence the semiconductor processing landscape, as she develops solutions that enhance efficiency and effectiveness in substrate treatments. With 52 patents to her name, Judy H. Huang stands as a testament to the importance of inventive spirit in driving technological advancements.