The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Dec. 27, 2011
Alexander J. Berger, Palo Alto, CA (US);
Terry Bluck, Santa Clara, CA (US);
Vinay Shah, San Mateo, CA (US);
Judy Huang, Los Gatos, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Chau T. Nguyen, San Jose, CA (US);
Greg Stumbo, Scotts Valley, CA (US);
Alexander J. Berger, Palo Alto, CA (US);
Terry Bluck, Santa Clara, CA (US);
Vinay Shah, San Mateo, CA (US);
Judy Huang, Los Gatos, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Chau T. Nguyen, San Jose, CA (US);
Greg Stumbo, Scotts Valley, CA (US);
Intevac, Inc., Santa Clara, CA (US);
Abstract
Disclosed are methods and apparatus for masking of substrates for deposition, and subsequent lifting of the mask with deposited material. Masking materials are utilized that can be used in high temperatures and vacuum environment. The masking material has minimal outgassing once inside a vacuum chamber and withstand the temperatures during deposition process. The mask is inkjeted over the wafers and, after deposition, removed using agitation, such as ultrasonic agitation, or using laser burn off.