The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Jan. 04, 2011
Vishal Gauri, Fremont, CA (US);
Raashina Humayun, Fremont, CA (US);
Chi-i Lang, Sunnyvale, CA (US);
Judy H. Huang, Los Gatos, CA (US);
Michael Barnes, San Ramon, CA (US);
Sunil Shanker, Santa Clara, CA (US);
Vishal Gauri, Fremont, CA (US);
Raashina Humayun, Fremont, CA (US);
Chi-I Lang, Sunnyvale, CA (US);
Judy H. Huang, Los Gatos, CA (US);
Michael Barnes, San Ramon, CA (US);
Sunil Shanker, Santa Clara, CA (US);
Novellus Systems, Inc., Fremont, CA (US);
Abstract
Methods of this invention relate to filling gaps on substrates with a solid dielectric material by forming a flowable film in the gap. The flowable film provides consistent, void-free gap fill. The film is then converted to a solid dielectric material. In this manner gaps on the substrate are filled with a solid dielectric material. According to various embodiments, the methods involve reacting a dielectric precursor with an oxidant to form the dielectric material. In certain embodiments, the dielectric precursor condenses and subsequently reacts with the oxidant to form dielectric material. In certain embodiments, vapor phase reactants react to form a condensed flowable film.