Juanjuan Li

Title: Innovations of Juanjuan Li

Introduction

Juanjuan Li is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of integrated circuits and memory devices. With a total of six patents to his name, Li has demonstrated a strong commitment to advancing technology.

Latest Patents

One of his latest patents includes a stack capacitor and a flash memory device, along with a manufacturing method thereof. This innovation features a memory transistor structure that comprises a substrate, a tunneling oxide layer, a floating gate layer, an interlayer dielectric layer, and a control gate layer, all sequentially stacked on the substrate. The interlayer dielectric layer consists of a first oxide layer and a nitride layer. Additionally, the stack capacitor includes a first contact leading out of the control gate layer and a second contact leading out of the floating gate layer. The capacitance per unit area of the stack capacitor is effectively improved, and the size of the transistor device is reduced. Notably, the manufacturing method does not require any additional photomask compared to conventional process flows.

Career Highlights

Juanjuan Li has worked with notable companies such as Shanghai Huali Integrated Circuit Corporation and Shanghai Huali Integrated Circuit Manufacturing Co., Ltd. His experience in these organizations has contributed to his expertise in the field of integrated circuits.

Collaborations

Some of his coworkers include Haoyu Chen and Zhi Tian, who have collaborated with him on various projects.

Conclusion

Juanjuan Li's innovative work in the field of flash memory devices and integrated circuits showcases his dedication to technological advancement. His contributions continue to influence the industry and pave the way for future innovations.