The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2022

Filed:

Nov. 16, 2020
Applicant:

Shanghai Huali Integrated Circuit Mfg. Co., Ltd., Shanghai, CN;

Inventors:

Qiwei Wang, Shanghai, CN;

Jinshuang Zhang, Shanghai, CN;

Haoyu Chen, Shanghai, CN;

Rong Zou, Shanghai, CN;

Juanjuan Li, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11531 (2017.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/28 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 27/11521 (2017.01); H01L 29/788 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11531 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 27/11521 (2013.01); H01L 29/40114 (2019.08); H01L 29/66492 (2013.01); H01L 29/66825 (2013.01); H01L 29/7833 (2013.01); H01L 29/7881 (2013.01);
Abstract

The present disclosure provides a non-volatile flash memory device and a manufacturing method thereof. The non-volatile flash memory device comprises at least a plurality of memory cells in a memory area. The manufacturing method comprises: providing a substrate, and defining the memory area of the non-volatile flash memory device on the substrate; forming a plurality of stack gates of the plurality of memory cells on a substrate corresponding to the memory area, and the top of each stack gate is a memory control gate of the memory cell; etching the memory control gates to reduce the height of the memory control gates with the fluid photoresist filled among the plurality of stack gates of the plurality of memory cells as a mask; and removing the fluid photoresist.


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