Location History:
- Trumbul, CT (US) (2003)
- Wilton, CT (US) (2004)
- Trumbull, CT (US) (2002 - 2007)
- Trumball, CT (US) (2008)
Company Filing History:
Years Active: 2002-2008
As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can definitely help you with that! I will provide you with an article about inventor Jorge S Ivaldi based on the data provided. Here is the structured information for the article:
Title: The Inventor Spotlight: Jorge S Ivaldi
Introduction:
Jorge S Ivaldi, a talented inventor hailing from Trumbull, CT (US), has made significant contributions to the field of photolithography with a total of 14 patents to his name.
Latest Patents:
1. System for a pellicle frame with heightened bonding surfaces: This innovative system focuses on maintaining an optical gap between optical structures in a photolithography system. It involves a frame with spaced spacing members and a bonding agent, ensuring precision and efficiency in optical alignment.
2. System and method for reticle protection and transport: This patent addresses the need for substrate protection during the transition from atmospheric pressure to vacuum in lithography tools. It includes a sophisticated cassette-substrate arrangement with filters and vents for particle control.
Career Highlights:
Jorge S Ivaldi has showcased his expertise in companies such as ASML Holding N.V. and ASML US, Inc., where he honed his skills and contributed to groundbreaking innovations in the field of photolithography. His dedication and passion for technological advancement are evident in his patent portfolio.
Collaborations:
Throughout his career, Jorge worked alongside esteemed colleagues such as Joseph Laganza and Glenn Friedman, fostering a collaborative environment and driving forward-thinking solutions in the industry.
Conclusion:
In conclusion, Jorge S Ivaldi's remarkable patented inventions reflect his commitment to pushing the boundaries of photolithography technology. His contributions have undoubtedly left a lasting impact on the field, paving the way for future innovations and advancements.
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