The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Feb. 10, 2000
Applicant:
Inventor:
Jorge Ivaldi, Trumbull, CT (US);
Assignee:
ASML US, Inc., Wilton, CT (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/762 ; G03B 2/732 ; A47G 1/12 ;
U.S. Cl.
CPC ...
G03B 2/762 ; G03B 2/732 ; A47G 1/12 ;
Abstract
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the purged optical gap. A porous frame includes a first and a second opposing surface. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. A gas supply interface infuses a purge gas through the porous frame and into the gap.